Impurity in a sputtering material affects the quality of the deposited thin film. It causes issues like poor adhesion, non-uniformity, cracks, and electrical disruptions. Even small amounts of contaminant particles incorporated into the film, degrade its desired properties. Therefore, high-purity targets are crucial for producing high-quality coatings in sputtering processes.
Process Materials has a wide variety of materials including precious and non-precious materials. Pure elements, compounds and alloys in purities ranging from 99% to 99.9999% are available for both R&D and production of sputtering targets.
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