Choosing the proper Sputtering Target Materials is as important as choosing the format. Process Materials has a wide variety  of materials including  precious and non-precious materials including pure elements, compounds and alloys in purities ranging from 99% to 99.9999% for both R&D and production of sputtering targets. 

Impurities in a sputtering target can significantly affect the quality of the deposited thin film by causing issues like poor adhesion, non-uniformity, cracks, and electrical disruptions as even small amounts of contaminant particles can be incorporated into the film, degrading its desired properties; therefore, high-purity targets are crucial for producing high-quality coatings in sputtering processes.

When choosing materials, consider the following:
Properties: The material should have the properties you need for the thin film you want to create.
Purity: Impurities in the material can affect the properties of the thin film.
Size and shape: The target’s size and shape should be based on what you’re coating and the deposition system you’re using.