FEATURED PRODUCT
THIN FILM PLANAR TARGETS
Process Materials manufactures precision thin film planar targets for high-performance PVD and magnetron sputtering systems. Our planar sputtering targets are engineered for uniform erosion, extended target life, and superior film consistency.
Our planar targets are optimized for demanding vacuum thin film applications requiring reliability and repeatable performance.
We provide:
- Custom lengths and widths
- High-purity metals and alloys
- Precision-machined backing tubes
- Expert target bonding services
Available Materials Include:
- Aluminum (Al)
- Copper (Cu)
- Titanium (Ti)
- Tantalum (Ta)
- Precious metals
- Custom alloys
SPUTTERING FORMATS
Process Materials Inc. is a leading supplier of consumable materials serving the thin film industry, specifically sputtering target formats. For instance, planar sputtering targets and cylindrical sputtering targets used in the production of flat panel displays, data storage devices, architectural glass, automotive glass, photovoltaic, optical media, decorative coating, AR, LCDs, hard coatings, etc. Target materials available include pure metals (including precious metals), alloys and compounds. We also carry a full line of evaporation materials.
From sintering to thermal spraying to vacuum, powder and casting metallurgy, Process Materials ensures the integrity of all our sputtering target formats because of our advanced, controlled process technology.
We meet our customers’ PVD requirements on every order, whether large or small.